net deposits中文什么意思

例句与用法

1. for xrd, ellipsometry examinations, single-side-polished si ( lll ) wafers were used as substrates and for resistance measurement, glass was used and for infrared examination, double-side-polished si ( lll ) wafers were used and for ultraviolet-visible spectrophotometry, double-side-polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation, cu nets deposited by formvar film were used . the cu-mgf2 cermet films were from 50 to 600nm thick
   用于xrd分析、椭偏测量的单抛si(111)晶片和电阻测试的载玻片上淀积膜厚约为600nm；用于ir测试的双抛si(111)晶片和uv测试的石英玻璃片上淀积膜厚约为250nm；用于透射电镜分析的样品则淀积在400目铜网上的支撑formvar膜上，膜厚约为50100nm。